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ETHZ (ETH Zurich, High Voltage Laboratory)click to expand or collapse

Data Group [C5F10O_JPD]: Chachereau A, Hösl A, Franck C M 2018 Electrical insulation properties of the perfluoroketone C5F10O, J. Phys. D: Appl. Phys. 51 335204.

e / C5F10O:N2

e / C5F10O:N2 (0.13% C5F10O)

e / C5F10O:N2 (0.25% C5F10O)

e / C5F10O:N2 (1.01% C5F10O)

e / C5F10O:N2 (12.03% C5F10O)

e / C5F10O:N2 (19.96% C5F10O)

e / C5F10O:N2 (30.06% C5F10O)

e / C5F10O:N2 (39.85% C5F10O)

e / C5F10O:N2 (4.04% C5F10O)

e / C5F10O:N2 (8.06% C5F10O)

Data Group [ISH2019]: Egüz E, Chachereau A, Hösl A, Franck C M 2019 Measurements of Swarm Parameters in
C4F7N:O2:CO2, C5F10O:O2:CO2 and
C5F10O:O2:N2 Mixtures.

e / C5F10O:N2

e / C5F10O:N2 (95.07% N2 ; 4.93% C5F10O)

Data Group [2022_JPD_HighEN]: Vemulapalli, H., & Franck, C. M. (2023). Pulsed Townsend measurements with mixtures of C4F7N and C5F10O up to 1800 Td. Journal of Physics D: Applied Physics, 56(6), 065202. https://doi.org/10.1088/1361-6463/acaab7.

e / C5F10O:N2

e / C5F10O:N2 (1.00% C5F10O ; 99.00% N2)

e / C5F10O:N2 (13.38% C5F10O ; 86.62% N2)

e / C5F10O:N2 (4.93% C5F10O ; 95.07% N2)

e / C5F10O:N2 (5.11% C5F10O ; 94.89% N2)